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EUV lithography, Vivek Bakshi, SPIE 2009, 9780819469649
http://spiedigitallibrary.org/ebooks/spie/press_monographs/pm178?isAuthorized=no
Description
Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists.
This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field.
Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology.
cover and book markered
This is a different book from the above
http://www.knovel.com/web/portal/browse/display?_EXT_KNOVEL_DISPLAY_bookid=3503
http://ifile.it/z4kcpbr
EUV lithography, Vivek Bakshi, SPIE 2009, 9780819469649
http://spiedigitallibrary.org/ebooks/spie/press_monographs/pm178?isAuthorized=no
Description
Extreme ultraviolet lithography (EUVL) is the principal lithography technology aiming to manufacture computer chips beyond the current 193-nm-based optical lithography, and recent progress has been made on several fronts: EUV light sources, optics, optics metrology, contamination control, masks and mask handling, and resists.
This comprehensive volume is comprised of contributions from the world's leading EUVL researchers and provides all of the critical information needed by practitioners and those wanting an introduction to the field.
Interest in EUVL technology continues to increase, and this volume provides the foundation required for understanding and applying this exciting technology.
cover and book markered
This is a different book from the above
http://www.knovel.com/web/portal/browse/display?_EXT_KNOVEL_DISPLAY_bookid=3503
http://ifile.it/z4kcpbr