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Ion Implantation Technology: 16th International Conference on Ion Implantation Technology; IIT 2006 (AIP Conference Proceedings / Accelerators, Beams, and Instrumentations)
By Karen J. Kirkby, Russell M. Gwilliam, Andy Smith, David Chivers
Product Description:
All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter. This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. Topics included are: doping processes in semiconductors; plasma immersion ion implantation and plasma doping; materials - novel techniques and applications; implant technology; process control and yield; metrology; as well as machines.
By Karen J. Kirkby, Russell M. Gwilliam, Andy Smith, David Chivers
- Publisher: American Institute of Physics
- Number Of Pages: 664 pages
- Publication Date: 2006-12-04
- ISBN-10 / ASIN: 073540366X
- ISBN-13 / EAN: 9780735403666
Product Description:
All papers were peer-reviewed. Ion implantation is used to manufacture semiconductor devices. Materials properties are changed by bombarding wafers with atoms, which are accelerated in an ion implanter. This is the premier world conference for the presentation of the latest advances in ion implantation, from the fundamentals of ion-solid interactions to manufacturing implant equipment. Topics included are: doping processes in semiconductors; plasma immersion ion implantation and plasma doping; materials - novel techniques and applications; implant technology; process control and yield; metrology; as well as machines.
