Ion Implantation by Mark Goorsky
"Ion Implantation" ed. by Mark Goorsky
InTeOp | 2012 | ISBN: 9535106340 9789535106340 | 446 pages | PDF | 38 MB
Improvements in equipment, understanding of beam-solid interactions, applications to new materials, improved characterization techniques, and more recent developments to use implantation for nanostructure formation point to new directions for ion implantation and are presented in this book.
Contents
Preface
Section 1 Physics of Implantation
1 High-Resolution Ion Implantation from keV to MeV
2 Radio Frequency Quadrupole Accelerator: A High Energy and High Current Implanter
3 Coulomb Heating Behaviour of Fast Light Diclusters in Si<100> Direction
Section 2 Characterization
4 Lattice Strain Measurements in Hydrogen Implanted Materials for Layer Transfer Processes
5 Spectroscopic Ellipsometry of lon-lmplantation-lnduced Damage
6 Determination of Near-Neighbour Bonding in the Mn-lmplanted GaSb Crystals
Section 3 Materials Applications
7 Ion Implantation in Phase Change Ge2Sb2Te5 Thin Films for Non Volatile Memory Applications
8 Si Nanocrystal Arrays Created in Si02 Matrix by High-Energy Ion Bombardment
9 Nitridation of GaAs Surface by Low Energy Ion Implantation with In Situ Control of Chemical Composition
10 Neon and Manganese Ion Implantation into AlInN
11 Implantation Damage Formation in GaN and ZnO
Section 4 Advances in Processing
12 Optical Waveguides Fabricated by Ion Implantation/Irradiation: A Review Optical Waveguides Fabricated by Ion Implantation/Irradiation: A Review
13 Ga3+ Focused Ion Beam for Piezo Electric Nano Structuration Fabrication
14 Ion Implantation for the Fabrication of Plasmonic Nanocomposites: A Brief Review
15 Annealing Effects on the Particle Formation and the Optical Response
16 Ion Implantation-Induced Layer Splitting of Semiconductors
17 Surface Modification by Ion Implantation to Improve the Oxidation Resistance of Materials for High Temperature Technology
InTeOp | 2012 | ISBN: 9535106340 9789535106340 | 446 pages | PDF | 38 MB
Improvements in equipment, understanding of beam-solid interactions, applications to new materials, improved characterization techniques, and more recent developments to use implantation for nanostructure formation point to new directions for ion implantation and are presented in this book.
Contents
Preface
Section 1 Physics of Implantation
1 High-Resolution Ion Implantation from keV to MeV
2 Radio Frequency Quadrupole Accelerator: A High Energy and High Current Implanter
3 Coulomb Heating Behaviour of Fast Light Diclusters in Si<100> Direction
Section 2 Characterization
4 Lattice Strain Measurements in Hydrogen Implanted Materials for Layer Transfer Processes
5 Spectroscopic Ellipsometry of lon-lmplantation-lnduced Damage
6 Determination of Near-Neighbour Bonding in the Mn-lmplanted GaSb Crystals
Section 3 Materials Applications
7 Ion Implantation in Phase Change Ge2Sb2Te5 Thin Films for Non Volatile Memory Applications
8 Si Nanocrystal Arrays Created in Si02 Matrix by High-Energy Ion Bombardment
9 Nitridation of GaAs Surface by Low Energy Ion Implantation with In Situ Control of Chemical Composition
10 Neon and Manganese Ion Implantation into AlInN
11 Implantation Damage Formation in GaN and ZnO
Section 4 Advances in Processing
12 Optical Waveguides Fabricated by Ion Implantation/Irradiation: A Review Optical Waveguides Fabricated by Ion Implantation/Irradiation: A Review
13 Ga3+ Focused Ion Beam for Piezo Electric Nano Structuration Fabrication
14 Ion Implantation for the Fabrication of Plasmonic Nanocomposites: A Brief Review
15 Annealing Effects on the Particle Formation and the Optical Response
16 Ion Implantation-Induced Layer Splitting of Semiconductors
17 Surface Modification by Ion Implantation to Improve the Oxidation Resistance of Materials for High Temperature Technology
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